Tunneling Archives - IEEE Transactions on Quantum Engineering

Impact of Interface Properties on Direct Tunneling in Al/ALD-Al₂O₃/Al Capacitors for Josephson Junction Applications

June 4, 2026Daniel Rocha-Aguilera, Gabriela Méndez-Jerónimo, Joel Molina-ReyesEarly Access, Open AccessAluminum, Aluminum oxide, Art, Capacitors, Films, Modeling, Motion pictures, Surfaces, Tunneling, Water

Abstract: The Al/AlOx/Al system is widely used for the fabrication of Josephson junctions, which constitute the central element of superconducting qubits. The process parameters for growing ultra-thin AlOx barriers by thermal oxidation in-between physical vapor deposition (PVD) runs of Al films are well understood, but the resulting barriers present several drawbacks that limit performance such […]

Cryogenic Floating-Gate CMOS Circuits for Quantum Control

Voltage biases are often required to bias Qubits, and yet applying a static bias requires separate chip wires, dramatically increasing the system complexity. An ideal approach would be having a nonvolatile digital or analog memory to avoid these issues. This article shows floating-gate (FG) structures could be used to set and forget potentials and tunnel […]