Impact of Interface Properties on Direct Tunneling in Al/ALD-Al₂O₃/Al Capacitors for Josephson Junction Applications
Abstract: The Al/AlOx/Al system is widely used for the fabrication of Josephson junctions, which constitute the central element of superconducting qubits. The process parameters for growing ultra-thin AlOx barriers by thermal oxidation in-between physical vapor deposition (PVD) runs of Al films are well understood, but the resulting barriers present several drawbacks that limit performance such […]